| Title: |
PMOSFET layout dependency with embedded SiGe Source/Drain at POLY and STI edge in 32/28nm CMOS technology |
| Authors: |
Song, L.; Liang, Y.; Onoda, H.; Lai, C. W.; Wallner, T. A.; Pofelski, A.; Gruensfelder, C.; Josse, E.; Okawa, T.; Brown, J.; Williams, R.Q.; Holt, J.; Weijtmans, J.W.; Greene, B.; Utomo, H. K.; Lee, S. C.; Nair, D.; Zhang, Q.; Zhu, C.; Wu, X.; Sherony, M.; Lee, Y. M.; Henson, W. K.; Divakaruni, R.; Kaste, E. |
| Source: |
Proceedings of Technical Program of 2012 VLSI Technology, System and Application VLSI Technology, Systems, and Applications (VLSI-TSA), 2012 International Symposium on. :1-2 Apr, 2012 |
| Relation: |
2012 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) |
| Database: |
IEEE Xplore Digital Library |