| Title: |
Kinetic Monte Carlo simulations for dopant diffusion and defects in Si and SiGe: Analysis of dopants in SiGe-channel Quantum Well |
| Authors: |
Noda, T.; Witters, L.; Mitard, J.; Rosseel, E.; Hellings, G.; Vrancken, C.; Eyben, P.; Bender, H.; Thean, A.; Horiguchi, N.; Vandervorst, W. |
| Source: |
2013 13th International Workshop on Junction Technology (IWJT) Junction Technology (IWJT), 2013 13th International Workshop on. :78-83 Jun, 2013 |
| Relation: |
2013 13th International Workshop on Junction Technology (IWJT) |
| Database: |
IEEE Xplore Digital Library |