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Analytical optimization of the Plasma Clean Cycle for a Nitride PECVD System as evaluated by Cost of Ownership

Title: Analytical optimization of the Plasma Clean Cycle for a Nitride PECVD System as evaluated by Cost of Ownership
Authors: Langan, J.; Sui Yuan Lynn; Huling, B.; Morgan, R.; Anderson, B.; Behnke, J.; Berman, M.; Kobessi, H.
Source: Proceedings. IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop Advanced Semiconductor Manufacturing Conference and Workshop, 1993. ASMC 93 Proceedings. IEEE/SEMI. :229-231 1993
Relation: Proceedings IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop
Database: IEEE Xplore Digital Library