| Title: |
Multiple gate oxide thickness for 2 GHz system-on-a-chip technologies |
| Authors: |
Liu, C.T.; Ma, Y.; Oh, M.; Diodato, P.W.; Stiles, K.R.; Mcmacken, J.R.; Li, F.; Chang, C.P.; Cheung, K.P.; Colonell, J.I.; Lai, W.Y.C.; Liu, R.; Lloyd, E.J.; Miner, J.F.; Pai, C.S.; Vaidya, H.; Frackoviak, J.; Timko, A.; Klemens, F.; Maynard, H.; Clemens, J.T. |
| Source: |
International Electron Devices Meeting 1998. Technical Digest (Cat. No.98CH36217) Electron devices - IEDM 1998 Electron Devices Meeting, 1998. IEDM '98. Technical Digest., International. :589-592 1998 |
| Relation: |
International Electron Devices Meeting 1998. Technical Digest |
| Database: |
IEEE Xplore Digital Library |