| Title: |
Comparison of key fine-line BEOL metallization schemes for beyond 7 nm node |
| Authors: |
Nogami, T.; Zhang, X.; Kelly, J.; Briggs, B.; You, H.; Patlolla, R.; Huang, H.; McLaughlin, P.; Lee, J.; Shobha, H.; Nguyen, S.; DeVries, S.; Demarest, J.; Lian, G.; Li, J.; Maniscalco, J.; Bhosale, P.; Lin, X.; Peethala, B.; Lanzillo, N.; Kane, T.; Yang, C. C.; Motoyama, K.; Sil, D.; Spooner, T.; Canaperi, D.; Standaert, T.; Lian, S.; Grill, A.; Edelstein, D.; Paruchuri, V. |
| Source: |
2017 Symposium on VLSI Technology VLSI Technology, 2017 Symposium on. :T148-T149 Jun, 2017 |
| Relation: |
2017 Symposium on VLSI Technology |
| Database: |
IEEE Xplore Digital Library |