| Title: |
Atomic scale modeling of boron transient diffusion in silicon |
| Authors: |
Caturla, M.J.; Lilak, A.; Johnson, M.D.; Giles, M.; Diaz de la Rubia, T.; Law, M.; Foad, M. |
| Source: |
1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144) Ion implantation technology Ion Implantation Technology Proceedings, 1998 International Conference on. 2:1022-1025 vol.2 1998 |
| Relation: |
1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98 |
| Database: |
IEEE Xplore Digital Library |