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High Performance GaN-on-Si Power Devices with Ultralow Specific On-resistance Using Novel Strain Method Fabricated on 200 mm CMOS-Compatible Process Platform

Title: High Performance GaN-on-Si Power Devices with Ultralow Specific On-resistance Using Novel Strain Method Fabricated on 200 mm CMOS-Compatible Process Platform
Authors: Wong, Roy K.-Y.; Chiu, H. C.; Zhang, J. H.; Zhou, C.; Zhao, Thomas; Wu, Y. B.; Liao, Henry; He, Simon; Zhang, A. B.; Zou, Y.B.; Li, Seiya; Zhang, Martin; Wu, Macro; Lee, John; Chen, P.W.; Xie, Andy; Zhang, Jeff
Source: 2019 31st International Symposium on Power Semiconductor Devices and ICs (ISPSD) Power Semiconductor Devices and ICs (ISPSD), 2019 31st International Symposium on. :67-70 May, 2019
Relation: 2019 31st International Symposium on Power Semiconductor Devices and ICs (ISPSD)
Database: IEEE Xplore Digital Library