Epitaxial Growth of (Si)GeSn Source/Drain Layers for Advanced Ge Gate All Around Devices
| Title: | Epitaxial Growth of (Si)GeSn Source/Drain Layers for Advanced Ge Gate All Around Devices |
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| Authors: | Loo, R.; Vohra, A.; Porret, C.; Hikavyy, A.; Rosseel, E.; Schaekers, M.; Capogreco, E.; Shimura, Y.; Kohen, D.; Tolle, J.; Vandervorst, W. |
| Source: | 2019 Compound Semiconductor Week (CSW) Compound Semiconductor Week (CSW), 2019. :1-2 May, 2019 |
| Relation: | 2019 Compound Semiconductor Week (CSW) |
| Database: | IEEE Xplore Digital Library |