| Title: |
Exploring the limits of pre-amorphization implants on controlling channeling and diffusion of low energy B implants and ultra shallow junction formation |
| Authors: |
Al-Bayati, A.; Tandon, S.; Mayur, A.; Foad, M.; Wagner, D.; Murto, R.; Sing, D.; Ferguson, C.; Larson, L. |
| Source: |
2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) Ion implantation technology Ion Implantation Technology, 2000. Conference on. :54-61 2000 |
| Relation: |
2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 |
| Database: |
IEEE Xplore Digital Library |