| Title: |
3D Sequential Low Temperature Top Tier Devices using Dopant Activation with Excimer Laser Anneal and Strained Silicon as Performance Boosters |
| Authors: |
Vandooren, A.; Wu, Z.; Parihar, N.; Franco, J.; Parvais, B.; Matagne, P.; Debruyn, H.; Mannaert, G.; Devriendt, K.; Teugels, L.; Vecchio, E.; Radisic, D.; Rosseel, E.; Hikavyy, A.; Chan, B. T.; Waldron, N.; Mitard, J.; Besnard, G.; Alvarez, A.; Gaudin, G.; Schwarzenbach, W.; Radu, I.; Nguyen, B. Y.; Huet, K.; Tabata, T.; Mazzamuto, F.; Demuynck, S.; Boemmels, J.; Collaert, N.; Horiguchi, N. |
| Source: |
2020 IEEE Symposium on VLSI Technology VLSI Technology, 2020 IEEE Symposium on. :1-2 Jun, 2020 |
| Relation: |
2020 IEEE Symposium on VLSI Technology |
| Database: |
IEEE Xplore Digital Library |