Plasma Charging Damage in HK-First and HK-Last RMG NMOS Devices
| Title: | Plasma Charging Damage in HK-First and HK-Last RMG NMOS Devices |
|---|---|
| Authors: | Hiblot, G.; Parihar, N.; Dupuy, E.; Mannaert, G.; Baudot, S.; Kaczer, B.; Franco, J.; Vandooren, A.; De Heyn, V.; Mercha, A. |
| Source: | IEEE Transactions on Device and Materials Reliability IEEE Trans. Device Mater. Relib. Device and Materials Reliability, IEEE Transactions on. 21(2):192-198 Jun, 2021 |
| Database: | IEEE Xplore Digital Library |