Influence of Resist Profile on DRIE Sidewall Morphology
| Title: | Influence of Resist Profile on DRIE Sidewall Morphology |
|---|---|
| Authors: | MacDonald, Robert J.; Goswami, Shubhodeep; Ruffalo, Renner; Edmond, Matthew; Szymanski, Charles |
| Source: | 2021 32nd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) Advanced Semiconductor Manufacturing Conference (ASMC), 2021 32nd Annual SEMI. :1-4 May, 2021 |
| Relation: | 2021 32nd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) |
| Database: | IEEE Xplore Digital Library |