| Title: |
Low Temperature Atomic Hydrogen Treatment for Superior NBTI Reliability—Demonstration and Modeling across SiO2 IL Thicknesses from 1.8 to 0.6 nm for I/O and Core Logic |
| Authors: |
Franco, J.; de Marneffe, J.-F.; Vandooren, A.; Arimura, H.; Ragnarsson, L.-A; Claes, D.; Litta, E. Dentoni; Horiguchi, N.; Croes, K.; Linten, D.; Grasser, T.; Kaczer, B. |
| Source: |
2021 Symposium on VLSI Technology VLSI Technology, 2021 Symposium on. :1-2 Jun, 2021 |
| Relation: |
2021 Symposium on VLSI Technology |
| Database: |
IEEE Xplore Digital Library |