| Title: |
Forksheet FETs for Advanced CMOS Scaling: Forksheet-Nanosheet Co-Integration and Dual Work Function Metal Gates at 17nm N-P Space |
| Authors: |
Mertens, H.; Ritzenthaler, R.; Oniki, Y.; Briggs, B.; Chan, B.T.; Hikavyy, A.; Hopf, T.; Mannaert, G.; Tao, Z.; Sebaai, F.; Peter, A.; Vandersmissen, K.; Dupuy, E.; Rosseel, E.; Batuk, D.; Geypen, J.; Martinez, G. T.; Abigail, D.; Grieten, E.; Dehave, K.; Mitard, J.; Subramanian, S.; Ragnarsson, L.-A.; Weckx, P.; Jang, D.; Chehab, B.; Hellings, G.; Ryckaert, J.; Litta, E. Dentoni; Horiguchi, N. |
| Source: |
2021 Symposium on VLSI Technology VLSI Technology, 2021 Symposium on. :1-2 Jun, 2021 |
| Relation: |
2021 Symposium on VLSI Technology |
| Database: |
IEEE Xplore Digital Library |