| Title: |
Physical characterisation of high-k gate stacks deposited on HF-last surfaces |
| Authors: |
Bender, H.; Conard, T.; Nohira, H.; Petry, J.; Richard, O.; Zhao, C.; Brijs, B.; Besling, W.; Detavernier, C.; Vandervorst, W.; Caymax, M.; De Gendt, S.; Chen, J.; Kluth, J.; Tsai, W.; Maes, J.W. |
| Source: |
Extended Abstracts of International Workshop on Gate Insulator. IWGI 2001 (IEEE Cat. No.01EX537) Gate insulator Gate Insulator, 2001. IWGI 2001. Extended Abstracts of International Workshop on. :86-92 2001 |
| Relation: |
Extended Abstracts of International Workshop on Gate Insulator. IWGI 2001 |
| Database: |
IEEE Xplore Digital Library |