Interaction Between Low Temperatures Spacers and Source Drain Extensions and Pockets for Both NMOS and PMOS of the 65 nm Node Technology
| Title: | Interaction Between Low Temperatures Spacers and Source Drain Extensions and Pockets for Both NMOS and PMOS of the 65 nm Node Technology |
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| Authors: | Cagnat, NathalieAff1; Laviron, CyrilleAff2; Mathiot, DanielAff3; Morin, PierreAff4; Salvetti, FrédéricAff5; Villanueva, DavyAff5; Juhel, MarcAff4; Hopstaken, MarcoAff5; Wacquant, FrançoisAff4 |
| Source: | MRS Online Proceedings Library. 912(1) |
| Database: | Springer Nature Journals |